Issued Patents 2003
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6632740 | Two-step process for nickel deposition | Jacques Bertrand | 2003-10-14 |
| 6627504 | Stacked double sidewall spacer oxide over nitride | Jacques Bertrand | 2003-09-30 |
| 6605513 | Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing | Eric N. Paton, Ercan Adem, Jacques Bertrand, Paul R. Besser, Matthew S. Buynoski +4 more | 2003-08-12 |
| 6602754 | Nitrogen implant into nitride spacer to reduce nickel silicide formation on spacer | Minh Van Ngo, Paul R. Besser | 2003-08-05 |
| 6562718 | Process for forming fully silicided gates | Qi Xiang, Ercan Adem, Jacques Bertrand, Paul R. Besser, Matthew S. Buynoski +5 more | 2003-05-13 |
| 6562717 | Semiconductor device having multiple thickness nickel silicide layers | Christy Mei-Chu Woo, Qi Xiang | 2003-05-13 |
| 6555453 | Fully nickel silicided metal gate with shallow junction formed | Qi Xiang, Christy Mei-Chu Woo | 2003-04-29 |
| 6544872 | Dopant implantation processing for improved source/drain interface with metal silicides | Matthew S. Buynoski, Qi Xiang | 2003-04-08 |
| 6541866 | Cobalt barrier for nickel silicidation of a gate electrode | Jacques Bertrand, Christy Mei-Chu Woo, Minh Van Ngo | 2003-04-01 |
| 6521515 | Deeply doped source/drains for reduction of silicide/silicon interface roughness | — | 2003-02-18 |