Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6395095 | Process apparatus and method for improved plasma processing of a substrate | William Jones, Edward L. Sill, Thomas J. Licata | 2002-05-28 |
| 6368987 | Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions | Stanislaw Kopacz, Douglas A. Webb, Gerrit J. Leusink, Rene E. LeBlanc, Michael S. Ameen +2 more | 2002-04-09 |