JH

Joseph T. Hillman

TL Tokyo Electron Limited: 6 patents #8 of 413Top 2%
📍 Chandler, AZ: #6 of 290 inventorsTop 3%
🗺 Arizona: #38 of 2,228 inventorsTop 2%
Overall (2002): #5,993 of 266,432Top 3%
6
Patents 2002

Issued Patents 2002

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
6500761 Method for improving the adhesion and durability of CVD tantalum and tantalum nitride modulated films by plasma treatment Cory Wajda 2002-12-31
6482477 Method for pretreating dielectric layers to enhance the adhesion of CVD metal layers thereto Richard Westhoff, Steven P. Caliendo 2002-11-19
6471782 Precursor deposition using ultrasonic nebulizer Ching-Ping Fang 2002-10-29
6455414 Method for improving the adhesion of sputtered copper films to CVD transition metal based underlayers Cory Wajda, Steven P. Caliendo 2002-09-24
6409837 Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor 2002-06-25
6368987 Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions Stanislaw Kopacz, Douglas A. Webb, Gerrit J. Leusink, Rene E. LeBlanc, Michael S. Ameen +2 more 2002-04-09