Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6479373 | Method of structuring layers with a polysilicon layer and an overlying metal or metal silicide layer using a three step etching process with fluorine, chlorine, bromine containing gases | Joerg Dreybrodt, Dirk Drescher, Stephan Wege | 2002-11-12 |
| 6362098 | Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate | Terry A. Breeden, Iraj Shahvandi, Michael Tucker, Olivier Vatel, Karl Mautz | 2002-03-26 |