DD

Donald J. Delehanty

IBM: 1 patents #1,916 of 5,400Top 40%
📍 Wappingers Falls, NY: #77 of 143 inventorsTop 55%
🗺 New York: #3,002 of 9,277 inventorsTop 35%
Overall (2002): #228,488 of 266,432Top 90%
1
Patents 2002

Issued Patents 2002

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6425956 Process for removing chemical mechanical polishing residual slurry John M. Cotte, Kenneth McCullough, Wayne M. Moreau, John P. Simons, Charles J. Taft +1 more 2002-07-30