Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475908 | Dual metal gate process: metals and their silicides | Wenhe Lin, Mei Sheng Zhou, Simon Chooi | 2002-11-05 |
| 6458695 | Methods to form dual metal gates by incorporating metals and their conductive oxides | Wenhe Lin, Mei Sheng Zhou, Simon Chooi | 2002-10-01 |
| 6410429 | Method for fabricating void-free epitaxial-CoSi2 with ultra-shallow junctions | Chaw Sing Ho, Kheng Chok Tee, G. Karunasiri, Soo Jin Chua, Kong Hean Lee +1 more | 2002-06-25 |
| 6391731 | Activating source and drain junctions and extensions using a single laser anneal | Yung Fu Chong, Alex See | 2002-05-21 |
| 6387784 | Method to reduce polysilicon depletion in MOS transistors | Yung Fu Chong, Randall Cher Liang Cha, Lap Chan | 2002-05-14 |
| 6365446 | Formation of silicided ultra-shallow junctions using implant through metal technology and laser annealing process | Yung Fu Chong, Alex See | 2002-04-02 |
| 6339021 | Methods for effective nickel silicide formation | Wee Leng Tan, Simon Chooi | 2002-01-15 |
| 6335253 | Method to form MOS transistors with shallow junctions using laser annealing | Yung Fu Chong, Alex See, Andrew Thye Shen Wee | 2002-01-01 |