Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6496306 | Catadioptric optical system and exposure apparatus having the same | David Shafer, Helmut Beierl, Gerhard Furter, Wilhelm Ulrich | 2002-12-17 |
| 6483573 | Projection exposure system and an exposure method in microlithography | — | 2002-11-19 |
| 6451462 | Optical unit and method for making the same | — | 2002-09-17 |
| 6438199 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Udo Dinger, Wolfgang Singer, Martin Antoni | 2002-08-20 |
| 6417974 | Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production method | — | 2002-07-09 |
| 6392800 | Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement | — | 2002-05-21 |
| 6366410 | Reticular objective for microlithography-projection exposure installations | Jorg Schultz, Johannes Wangler | 2002-04-02 |
| 6349005 | Microlithographic reduction objective, projection exposure equipment and process | Helmut Beierl | 2002-02-19 |