HF

Henryk Fiedorowicz

AB Asml Netherlands B.V.: 2 patents #1 of 55Top 2%
Overall (2002): #63,280 of 266,432Top 25%
2
Patents 2002

Issued Patents 2002

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6469310 Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus Frederik Bijkerk, Cornelis Cornelia De Bruijn, Andrzej Bartnik 2002-10-22
6452194 Radiation source for use in lithographic projection apparatus Frederik Bijkerk, Cornelis Cornelia De Bruijn, Andrzej Bartnik, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine 2002-09-17