Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494766 | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing | Andreas Norbert Wiswesser, Wallter Waiter Schoenleber | 2002-12-17 |
| 6399501 | Method and apparatus for detecting polishing endpoint with optical monitoring | Manoocher Birang, Nils Johansson | 2002-06-04 |
| 6383058 | Adaptive endpoint detection for chemical mechanical polishing | Manoocher Birang | 2002-05-07 |