Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691090 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki | 1997-11-25 |
| 5674647 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1997-10-07 |
| 5629114 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region | Ryoichi Kobayashi, Nobuyuki Yoshioka, Yaichiro Watakabe, Junji Miyazaki | 1997-05-13 |
| 5605776 | Phase-shifting photomask blank, phase-shifting photomask, and method of manufacturing them | Susumu Kawada, Atsushi Hayashi, Nobuyuki Yoshioka, Kazuyuki Maetoko | 1997-02-25 |