Issued Patents 1997
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691090 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki | 1997-11-25 |
| 5674647 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki, Kouichiro Narimatsu +1 more | 1997-10-07 |
| 5644381 | Method of exposure employing phase shift mask of attenuation type | Junji Miyazaki | 1997-07-01 |
| 5629114 | Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region | Akihiko Isao, Ryoichi Kobayashi, Yaichiro Watakabe, Junji Miyazaki | 1997-05-13 |
| 5605776 | Phase-shifting photomask blank, phase-shifting photomask, and method of manufacturing them | Akihiko Isao, Susumu Kawada, Atsushi Hayashi, Kazuyuki Maetoko | 1997-02-25 |
| 5593801 | Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask | Junji Miyazaki | 1997-01-14 |