Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691249 | Method for fabricating polycrystalline silicon having micro roughness on the surface | Toru Tatsumi | 1997-11-25 |
| 5661052 | Method of fabricating semiconductor device having low-resistance gate electrode and diffusion layers | Ken Inoue, Makoto Sekine, Ichirou Honma | 1997-08-26 |
| 5658417 | HF vapor selective etching method and apparatus | Mitsusuke Kyogoku | 1997-08-19 |
| 5623243 | Semiconductor device having polycrystalline silicon layer with uneven surface defined by hemispherical or mushroom like shape silicon grain | Toru Tatsumi | 1997-04-22 |