Issued Patents 1997
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5691249 | Method for fabricating polycrystalline silicon having micro roughness on the surface | Hirohito Watanabe | 1997-11-25 |
| 5623243 | Semiconductor device having polycrystalline silicon layer with uneven surface defined by hemispherical or mushroom like shape silicon grain | Hirohito Watanabe | 1997-04-22 |