Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698362 | 1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist pattern | Mineo Nishi, Makoto Ikemoto, Tadashi Kusumoto, Yasuhiro Kawase | 1997-12-16 |
| 5695906 | Photosensitive resin composition and method for forming a pattern using the composition | Mineo Nishi, Keisuke Nakano, Iwao Matsuo | 1997-12-09 |
| 5660967 | Photosensitive resin composition and method for forming photoresist pattern using the same | Mineo Nishi, Yoshihiro Takada | 1997-08-26 |
| 5635329 | Photosensitive resin composition and method for forming a pattern using the composition | Mineo Nishi, Makoto Ikemoto | 1997-06-03 |