Issued Patents 1997
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698362 | 1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist pattern | Koji Nakano, Makoto Ikemoto, Tadashi Kusumoto, Yasuhiro Kawase | 1997-12-16 |
| 5695906 | Photosensitive resin composition and method for forming a pattern using the composition | Koji Nakano, Keisuke Nakano, Iwao Matsuo | 1997-12-09 |
| 5660967 | Photosensitive resin composition and method for forming photoresist pattern using the same | Koji Nakano, Yoshihiro Takada | 1997-08-26 |
| 5635329 | Photosensitive resin composition and method for forming a pattern using the composition | Koji Nakano, Makoto Ikemoto | 1997-06-03 |
| 5611850 | Composition for anti-reflective coating on resist | Tadashi Teramoto | 1997-03-18 |