Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5698455 | Method for predicting process characteristics of polyurethane pads | Guy F. Hudson | 1997-12-16 |
| 5691235 | Method of depositing tungsten nitride using a source gas comprising silicon | Trung T. Doan | 1997-11-25 |
| 5655951 | Method for selectively reconditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers | Lucky F. Marty | 1997-08-12 |
| 5609718 | Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers | — | 1997-03-11 |