Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5655110 | Method for setting and adjusting process parameters to maintain acceptable critical dimensions across each die of mass-produced semiconductor wafers | William D. Heavlin, David F. Kyser | 1997-08-05 |
| 5646870 | Method for setting and adjusting process parameters to maintain acceptable critical dimensions across each die of mass-produced semiconductor wafers | William D. Heavlin, David F. Kyser | 1997-07-08 |
| 5643428 | Multiple tier collimator system for enhanced step coverage and uniformity | David Bang | 1997-07-01 |
| 5601954 | Attenuated phase shift mask comprising phase shifting layer with parabolically shaped sidewalls | Christopher A. Spence | 1997-02-11 |