Issued Patents 1994
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi +2 more | 1994-01-25 |