Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5368783 | Negative-working radiation-sensitive resist composition | Masakazu Kobayashi, Toshimasa Nakayama | 1994-11-29 |
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hidekatsu Kohara, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama +2 more | 1994-01-25 |