Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5332647 | "Positive-working quinone diazide composition containing N,N',N""-substituted isocyanurate compound and associated article" | Hayato Ohno, Nobuo Tokutake, Satoshi Niikura, Toshimasa Nakayama | 1994-07-26 |
| 5281508 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama +2 more | 1994-01-25 |