Issued Patents 1994
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5366843 | Coated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancers | — | 1994-11-22 |
| 5346799 | Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde | David Brzozowy | 1994-09-13 |
| 5346808 | Positive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone | — | 1994-09-13 |
| 5312720 | Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone | Medhat A. Toukhy | 1994-05-17 |
| 5302688 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Kenji Honda, Andrew J. Blakeney, Sobhy Tadros | 1994-04-12 |
| 5283374 | Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures | — | 1994-02-01 |
| 5278021 | O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles | Medhat A. Toukhy | 1994-01-11 |