Issued Patents 1994
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5340687 | Chemically modified hydroxy styrene polymer resins and their use in photoactive resist compositions wherein the modifying agent is monomethylol phenol | — | 1994-08-23 |
| 5302688 | Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions | Alfred T. Jeffries, III, Andrew J. Blakeney, Sobhy Tadros | 1994-04-12 |
| 5300628 | Selected chelate resins and their use to remove multivalent metal impurities from resist components | — | 1994-04-05 |