Issued Patents 1994
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5338653 | Phenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patterns | — | 1994-08-16 |
| 5328806 | Positive image formation utilizing radiation sensitive mixture containing dimeric or trimeric sesamol/aldehyde condensation products as sensitivity enhancers | — | 1994-07-12 |
| 5316884 | Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer | — | 1994-05-31 |
| 5312720 | Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone | Alfred T. Jeffries, III | 1994-05-17 |
| 5278021 | O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles | Alfred T. Jeffries, III | 1994-01-11 |
| 5275911 | Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures | — | 1994-01-04 |