Issued Patents 1994
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5368901 | Method for the production of a bottom resist | Recai Sezi, Michael Sebald | 1994-11-29 |
| 5360693 | Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance | Michael Sebald, Recai Sezi, Seigfried Birkle, Hellmut Ahhe | 1994-11-01 |
| 5275920 | Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water | Recai Sezi, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 1994-01-04 |