Issued Patents 1994
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5360693 | Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance | Michael Sebald, Recai Sezi, Rainer Leuschner, Seigfried Birkle | 1994-11-01 |