Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5376499 | Highly heat-resistant positive resists comprising end-capped hydroxypolyamides | Albert Hammerschmidt, Hellmut Ahne | 1994-12-27 |
| 5275920 | Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water | Recai Sezi, Rainer Leuschner, Michael Sebald, Hellmut Ahne | 1994-01-04 |