Issued Patents 1994
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5371373 | Electron beam lithography method and apparatus separating repetitive and non-repetitive pattern data | Akira Hirakawa | 1994-12-06 |
| 5281827 | Charged particle beam exposure apparatus | Masamichi Kawano, Masahide Okumura, Haruo Yoda, Tadao Konishi | 1994-01-25 |