Issued Patents 1994
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5360692 | Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent | Kazuya Uenishi, Tadayoshi Kokubo | 1994-11-01 |
| 5340688 | Positive type photoresist composition | Toshiaki Aoai, Tadayoshi Kokubo | 1994-08-23 |
| 5340683 | Presensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compound | Syunichi Kondo, Akira Nagashima | 1994-08-23 |
| 5324619 | Positive quinone diazide photoresist composition containing select polyhydroxy additive | Kazuya Uenishi, Tadayoshi Kokubo | 1994-06-28 |
| 5324618 | Positive type quinonediazide photoresist composition containing select tetraphenolic additive | Shiro Tan, Tadayoshi Kokubo | 1994-06-28 |
| 5318875 | Positive quinonediazide photoresist composition containing select hydroxyphenol additive | Toshiaki Aoai, Tadayoshi Kokubo, Shiro Tan | 1994-06-07 |
| 5290658 | Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient | Kazuya Uenishi, Tadayoshi Kokubo | 1994-03-01 |