Issued Patents 1994
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5340688 | Positive type photoresist composition | Yasumasa Kawabe, Tadayoshi Kokubo | 1994-08-23 |
| 5338640 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Kazuyoshi Mizutani | 1994-08-16 |
| 5320928 | Photosensitive composition comprising a diazonium compound and a polyurethane | — | 1994-06-14 |
| 5318875 | Positive quinonediazide photoresist composition containing select hydroxyphenol additive | Yasumasa Kawabe, Tadayoshi Kokubo, Shiro Tan | 1994-06-07 |
| 5294511 | Photosensitive composition | Mitsunori Ono | 1994-03-15 |
| 5278273 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Kazuyoshi Mizutani | 1994-01-11 |
| 5276124 | Siloxane polymers and positive working light-sensitive compositions comprising the same | Kazuyoshi Mizutani | 1994-01-04 |