Issued Patents 1994
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5360692 | Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent | Yasumasa Kawabe, Kazuya Uenishi | 1994-11-01 |
| 5340686 | Positive-type photoresist composition | Shinji Sakaguchi, Shiro Tan | 1994-08-23 |
| 5340688 | Positive type photoresist composition | Yasumasa Kawabe, Toshiaki Aoai | 1994-08-23 |
| 5340697 | Negative type photoresist composition | Hiroshi Yoshimoto, Kazuya Uenishi | 1994-08-23 |
| 5324618 | Positive type quinonediazide photoresist composition containing select tetraphenolic additive | Yasumasa Kawabe, Shiro Tan | 1994-06-28 |
| 5324619 | Positive quinone diazide photoresist composition containing select polyhydroxy additive | Yasumasa Kawabe, Kazuya Uenishi | 1994-06-28 |
| 5318875 | Positive quinonediazide photoresist composition containing select hydroxyphenol additive | Yasumasa Kawabe, Toshiaki Aoai, Shiro Tan | 1994-06-07 |
| 5290658 | Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient | Kazuya Uenishi, Yasumasa Kawabe | 1994-03-01 |