Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4861729 | Method of doping impurities into sidewall of trench by use of plasma source | Genshu Fuse, Takashi Ohzone | 1989-08-29 |
| 4859908 | Plasma processing apparatus for large area ion irradiation | Akihisa Yoshida, Kentaro Setsune | 1989-08-22 |
| 4800174 | Method for producing an amorphous silicon semiconductor device using a multichamber PECVD apparatus | Shinichiro Ishihara, Masatoshi Kitagawa | 1989-01-24 |