Issued Patents 1989
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4854263 | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films | David N. Wang, John M. White, Dan Maydan | 1989-08-08 |
| 4842683 | Magnetic field-enhanced plasma etch reactor | David Cheng, Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews +4 more | 1989-06-27 |