Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4872947 | CVD of silicon oxide using TEOS decomposition and in-situ planarization process | David N. Wang, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins +3 more | 1989-10-10 |
| 4854263 | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films | Mei Chang, David N. Wang, Dan Maydan | 1989-08-08 |
| 4842683 | Magnetic field-enhanced plasma etch reactor | David Cheng, Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews +4 more | 1989-06-27 |