Issued Patents 1989
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4842683 | Magnetic field-enhanced plasma etch reactor | Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews, Mei Chang +4 more | 1989-06-27 |
| 4819167 | System and method for detecting the center of an integrated circuit wafer | Wesley W. Zhang | 1989-04-04 |