Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12319705 | Ruthenium precursor composition, preparation method therefor, and formation method for ruthenium-containing film using same | Yun-Tae Kim, Won Seok Han, Yoon A Park | 2025-06-03 |
| 11912728 | Aluminum compounds and methods of forming aluminum- containing film using the same | Won Seok Han, Dong Hwan Ma, Sungwoo AHN, Dae-Young Kim | 2024-02-27 |
| 11485749 | Group 4 metal element-containing compounds, method of preparing the same, precursor compositions including the same for forming a film, and method of forming a film using the same | Won Seok Han, Myeong-Ho Park | 2022-11-01 |
| 10763001 | Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition | Won Seok Han | 2020-09-01 |
| 10131680 | Group 4 metal element-containing alkoxy compound, preparing method thereof, precursor composition including the same for film deposition, and method of depositing film using the same | Won Seok Han, Myeong-Ho Park | 2018-11-20 |
| 10014089 | Liquid precursor compositions, preparation methods thereof, and methods for forming layer using the composition | Won Seok Han | 2018-07-03 |
| 10005795 | Group 4 metal element-containing compound, method of preparing the same, precursor composition including the same for depositing film, and method of depositing film using the same | Won Seok Han, Myeong-Ho Park | 2018-06-26 |
| 9957614 | Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same | Won Seok Han, So Young Kim | 2018-05-01 |
| 9431144 | Indium-containing oxide film and preparing method thereof | Byungsoo Kim, Dong Hwan Ma | 2016-08-30 |
| 9255324 | Aluminum precursor composition | Won Seok Han, Myeong-Ho Park | 2016-02-09 |
| 8215264 | Atomic layer deposition apparatus | Kyung Il Hong, Dae Youn Kim, Hyung Sang Park, Sang Jin Jeong, Herbert Terhorst | 2012-07-10 |
| 7976898 | Atomic layer deposition apparatus | Kyung Il Hong, Dae Youn Kim, Hyung Sang Park, Sang Jin Jeong, Herbert Terhorst | 2011-07-12 |
| 7476618 | Selective formation of metal layers in an integrated circuit | Olli Kilpela, Hannu Huotari, Marko Tuominen, Miika Leinikka | 2009-01-13 |
| 5955146 | Process for the preparation of magnesium oxide films using organomagnesium compounds | Yunsoo KIM, Sujin Ku | 1999-09-21 |