| 6676801 |
Pressure suppression device for chemical mechanical polishing machine and method thereof |
Chien-Hsin Lai, Jung-Nan Tseng, Huang-Yi Lin |
2004-01-13 |
| 6648729 |
Wafer pressure regulation system for polishing machine |
Chien-Hsin Lai, Cheng-Chi Hsieh, Jung-Nan Tseng, Huang-Yi Lin |
2003-11-18 |
| 6352244 |
Auxiliary gasline-heating unit in chemical vapor deposition |
Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng |
2002-03-05 |
| 6322057 |
Auxiliary gasline-heating unit in chemical vapor deposition |
Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng |
2001-11-27 |
| 6307163 |
Chemical mixer tank calibrator and calibrating method for the same |
Chien-Hsin Lai |
2001-10-23 |
| 6228420 |
Method to maintain consistent thickness of thin film deposited by chemical vapor deposition |
Juen-Kuen Lin, Chien-Hsin Lai, Hao-Kuang Chiu |
2001-05-08 |
| 6165255 |
Chemical-liquid controlling apparatus |
Chien-Hsin Lai, Peng-Yih Peng, Li-Min Chang |
2000-12-26 |
| 6129043 |
Gas tube with heating apparatus |
Chien-Hsin Lai |
2000-10-10 |
| 6120366 |
Chemical-mechanical polishing pad |
Juen-Kuen Lin, Chien-Hsin Lai, Peng-Yih Peng, Edward S. Yang, Kun-Lin Wu |
2000-09-19 |
| 5604152 |
CVD process for deposition of amorphous silicon |
Chao-Yang Chen |
1997-02-18 |