CH

Chia-Lin Hsu

UM United Microelectronics: 38 patents #99 of 4,560Top 3%
TSMC: 22 patents #1,516 of 12,232Top 15%
UE US Dept of Energy: 1 patents #1,355 of 5,099Top 30%
📍 Hsinchu, GA: #3 of 11 inventorsTop 30%
Overall (All Time): #37,648 of 4,157,543Top 1%
61
Patents All Time

Issued Patents All Time

Showing 51–61 of 61 patents

Patent #TitleCo-InventorsDate
6797190 Wafer carrier assembly for a chemical mechanical polishing apparatus and a polishing method using the same Art Yu, Shih-Hsun Hsu, Hsueh-Chung Chen 2004-09-28
6709544 Chemical mechanical polishing equipment Shao-Chung Hu, Hsueh-Chung Chen, Shih-Hsun Hsu 2004-03-23
6706140 Control system for in-situ feeding back a polish profile Shao-Chung Hu, Teng-Chun Tsai 2004-03-16
6696361 Post-CMP removal of surface contaminants from silicon wafer Shao-Chung Hu, Teng-Chun Tsai, Yung-Tsung Wei 2004-02-24
6660627 Method for planarization of wafers with high selectivities Shao-Chung Hu, Hsueh-Chung Chen, Shih-Hsun Hsu 2003-12-09
6638830 Method for fabricating a high-density capacitor Teng-Chun Tsai, Yi-Fang Cheng 2003-10-28
6638391 Wafer carrier assembly for a chemical mechanical polishing apparatus and a polishing method using the same Art Yu, Shih-Hsun Hsu, Hsueh-Chung Chen 2003-10-28
6616510 Chemical mechanical polishing method for copper Teng-Chun Tsai, Yung-Tsung Wei, Ming-Sheng Yang 2003-09-09
6593185 Method of forming embedded capacitor structure applied to logic integrated circuit Teng-Chun Tsai, Yi-Fang Cheng, Yi-Hsiung Lin 2003-07-15
6455432 Method for removing carbon-rich particles adhered on a copper surface Teng-Chun Tsai, Yung-Tsung Wei, Ming-Sheng Yang 2002-09-24
5435942 Process for treating alkaline wastes for vitrification 1995-07-25