| 11585970 |
Low loss single crystal multilayer optical component and method of making same |
Bertrand Bovard |
2023-02-21 |
| 9917193 |
III-N semiconductor layer on Si substrate |
Rytis Dargis, Andrew Clark, Nam Pham |
2018-03-13 |
| 9824886 |
Stress mitigating amorphous SiO2 interlayer |
Rytis Dargis, Andrew Clark |
2017-11-21 |
| 9496132 |
Nucleation of III-N on REO templates |
Andrew Clark, Rytis Dargis, Radek Roucka, Michael S. Lebby |
2016-11-15 |
| 9460917 |
Method of growing III-N semiconductor layer on Si substrate |
Rytis Dargis, Andrew Clark, Nam Pham |
2016-10-04 |
| 9443939 |
Strain compensated REO buffer for III-N on silicon |
Rytis Dargis, Radek Roucka, Andrew Clark, Michael S. Lebby |
2016-09-13 |
| 9431526 |
Heterostructure with carrier concentration enhanced by single crystal REO induced strains |
Rytis Dargis, Andrew Clark |
2016-08-30 |
| 9236249 |
III-N material grown on REN epitaxial buffer on Si substrate |
Rytis Dargis, Robin Smith, Andrew Clark, Michael S. Lebby |
2016-01-12 |
| 9142406 |
III-N material grown on ErAlN buffer on Si substrate |
Rytis Dargis, Andrew Clark, Nam Pham |
2015-09-22 |
| 9105471 |
Rare earth oxy-nitride buffered III-N on silicon |
Andrew Clark, Robin Smith, Michael S. Lebby |
2015-08-11 |
| 8994032 |
III-N material grown on ErAIN buffer on Si substrate |
Andrew Clark, Rytis Dargis |
2015-03-31 |
| 8878188 |
REO gate dielectric for III-N device on Si substrate |
Rytis Dargis, Robin Smith, Andrew Clark, Michael S. Lebby |
2014-11-04 |
| 8872308 |
AlN cap grown on GaN/REO/silicon substrate structure |
Michael S. Lebby, Andrew Clark, Rytis Dargis |
2014-10-28 |
| 8846504 |
GaN on Si(100) substrate using epi-twist |
Rytis Dargis, Andrew Clark, Radek Roucka |
2014-09-30 |
| 8835955 |
IIIOxNy on single crystal SOI substrate and III n growth platform |
Rytis Dargis, Andrew Clark, Michael S. Lebby |
2014-09-16 |
| 8823025 |
III-N material grown on AIO/AIN buffer on Si substrate |
Michael S. Lebby, Andrew Clark, Rytis Dargis |
2014-09-02 |
| 8823055 |
REO/ALO/A1N template for III-N material growth on silicon |
Michael S. Lebby, Andrew Clark, Rytis Dargis |
2014-09-02 |
| 8796121 |
Stress mitigating amorphous SiO2 interlayer |
Rytis Dargis, Andrew Clark |
2014-08-05 |
| 8748900 |
Re-silicide gate electrode for III-N device on Si substrate |
Rytis Dargis, Andrew Clark, Robin Smith, Michael S. Lebby |
2014-06-10 |
| 8679953 |
Crystalline REO template on silicon substrate |
Andrew Clark, Radek Roucka |
2014-03-25 |
| 8680507 |
A1N inter-layers in III-N material grown on DBR/silicon substrate |
Michael S. Lebby, Andrew Clark, Rytis Dargis |
2014-03-25 |
| 8664735 |
IR sensor using REO up-conversion |
Rytis Dargis, Andrew Clark, David L. Williams |
2014-03-04 |
| 8633569 |
AlN inter-layers in III-N material grown on REO/silicon substrate |
Michael S. Lebby, Andrew Clark, Rytis Dargis |
2014-01-21 |
| 8623747 |
Silicon, aluminum oxide, aluminum nitride template for optoelectronic and power devices |
Michael S. Lebby, Andrew Clark |
2014-01-07 |
| 8501635 |
Modification of REO by subsequent III-N EPI process |
Andrew Clark, Robin Smith, Rytis Dargis, Michael S. Lebby |
2013-08-06 |