Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7322131 | Shoe with slip preventive member | Yasuhiro Morikawa, Yutaka Nagai | 2008-01-29 |
| D552833 | Shoe | Hidenori Yamashita | 2007-10-16 |
| 7107954 | Internal combustion engine having thermal storage device | Rentaro Kuroki | 2006-09-19 |
| D416381 | Shoe cushioning system | Shinji Senda, Yasushi Shimizu | 1999-11-16 |
| 5895521 | Dust removing apparatus and dust removing method | Kenji Otsuka, Hiroshi Waki, Satoshi Arakawa, Toshiya Hatakeyama | 1999-04-20 |
| 5886997 | Mobile apparatus for performing data communication and presenting a display in accordance with the status of the data communication | Kazutoshi Shimada, Yasutomo Suzuki, Nobuyuki Niwa | 1999-03-23 |
| 5718063 | Midsole cushioning system | Kiyomitsu Kurosaki | 1998-02-17 |
| D380074 | Shoe sole | Shigeyuki Mitsui | 1997-06-24 |
| 5581560 | Communication apparatus and method for simultaneous communication of audio and data signals with improved audio control | Kazutoshi Shimada, Yasutomo Suzuki, Nobuyuki Niwa | 1996-12-03 |
| D369672 | Shoe sole | Minoru Tanaka | 1996-05-14 |
| 5480746 | Photomask and method of forming resist pattern using the same | Hideyuki Jinbo | 1996-01-02 |
| 5324600 | Method of forming resist pattern and photomask therefor | Hideyuki Jinbo, Yoshiyuki Kawazu | 1994-06-28 |
| 5128231 | Negative photoresist composition comprising a photosensitizer of a polyhalogen compound | Toshio Itoh, Miwa Sakata, Takateru Asano, Yuuzi Kosuga, Hiroshi Umehara | 1992-07-07 |
| 4889795 | Process for forming photoresist pattern using contrast enhancement layer with abietic acid | Katsuaki Kaifu, Maki Kosuge, Takateru Asano, Kenji Kobayashi | 1989-12-26 |
| 4845143 | Pattern-forming material | Toshio Ito, Miwa Sakata, Takateru Asano, Kenji Kobayashi | 1989-07-04 |
| 4801518 | Method of forming a photoresist pattern | Ryuji Kawazu, Toshio Itoh, Takateru Asano, Kenji Kobayashi | 1989-01-31 |
| 4609615 | Process for forming pattern with negative resist using quinone diazide compound | Ryuji Kawazu | 1986-09-02 |
| 4600684 | Process for forming a negative resist using high energy beam | Ryuji Kawazu | 1986-07-15 |
| 4312797 | Aqueous coating composition | Tetsuo Aihara, Yasuharu Nakayama, Kuninosuke Nakanishi, Isao Toyomoto | 1982-01-26 |
| 4309321 | Aqueous coating composition | Tetsuo Aihara, Yasuharu Nakayama | 1982-01-05 |
| 4278754 | Resists and method of manufacturing semiconductor elements by using the same | Mitsumasa Kunishi, Ryuji Kawazu | 1981-07-14 |