Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5948592 | Water-soluble photoresist composition | Hiroshi Umehara | 1999-09-07 |
| 5128231 | Negative photoresist composition comprising a photosensitizer of a polyhalogen compound | Toshio Itoh, Miwa Sakata, Yoshio Yamashita, Yuuzi Kosuga, Hiroshi Umehara | 1992-07-07 |
| 4889795 | Process for forming photoresist pattern using contrast enhancement layer with abietic acid | Katsuaki Kaifu, Maki Kosuge, Yoshio Yamashita, Kenji Kobayashi | 1989-12-26 |
| 4845143 | Pattern-forming material | Toshio Ito, Miwa Sakata, Yoshio Yamashita, Kenji Kobayashi | 1989-07-04 |
| 4801518 | Method of forming a photoresist pattern | Yoshio Yamashita, Ryuji Kawazu, Toshio Itoh, Kenji Kobayashi | 1989-01-31 |
| 4588669 | Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer | — | 1986-05-13 |
| 4560640 | Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof | Taichi Ichihashi, Wasaburo Kawai, Tadashi Naraoka | 1985-12-24 |