JW

Johannes F. M. Westendorp

TL Tokyo Electron Limited: 7 patents #1,084 of 5,567Top 20%
AN Asm International N.V.: 1 patents #116 of 197Top 60%
📍 Amsterdam, MA: #4 of 5 inventorsTop 80%
Overall (All Time): #662,040 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
6900129 CVD of tantalum and tantalum nitride films from tantalum halide precursors John Hautala 2005-05-31
6413860 PECVD of Ta films from tanatalum halide precursors John Hautala 2002-07-02
6410432 CVD of integrated Ta and TaNx films from tantalum halide precursors John Hautala 2002-06-25
6410433 Thermal CVD of TaN films from tantalum halide precursors John Hautala 2002-06-25
6268288 Plasma treated thermal CVD of TaN films from tantalum halide precursors John Hautala 2001-07-31
6265311 PECVD of TaN films from tantalum halide precursors John Hautala 2001-07-24
6143144 Method for etch rate enhancement by background oxygen control in a soft etch system Stephen N. Golovato 2000-11-07
5167761 Method for halide etching in the presence of water of semi-conductor substrates Hans W. Piekaar 1992-12-01