| 8551886 |
CMP process for processing STI on two distinct silicon planes |
Kyle P. Hunt, Leila Elvira Noriega, Billy Alan Wofford, Asadd M. Hosein, Binghua Hu |
2013-10-08 |
| 8264038 |
Buried floating layer structure for improved breakdown |
Sameer Pendharkar, Binghua Hu |
2012-09-11 |
| 8148228 |
Surface patterned topography feature suitable for planarization |
Sameer Pendharkar, Binghua Hu |
2012-04-03 |
| 8110414 |
Forming integrated circuit devices with metal-insulator-metal capacitors using selective etch of top electrodes |
Marshall O. Cathey, Jr., Pushpa Mahalingam, Weidong Tian, David C. Guiling, Binghua Hu +1 more |
2012-02-07 |
| 7595525 |
Integrated circuit capacitor having antireflective dielectric |
Bill Wofford, Blake Ryan Pasker, Binghua Hu |
2009-09-29 |
| 7118959 |
Integrated circuit capacitor having antireflective dielectric |
Bill Wofford, Blake Ryan Pasker, Binghua Hu |
2006-10-10 |
| 7112953 |
Method for detecting epitaxial (EPI) induced buried layer shifts in semiconductor devices |
Xiaoju Wu, John Kenneth Arch, Qingfeng Wang |
2006-09-26 |