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Method of forming a recessed contact bipolar transistor |
David B. Spratt, Robert H. Eklund, Eldon J. Zorinsky |
1994-05-31 |
| 5075241 |
Method of forming a recessed contact bipolar transistor and field effect device |
David B. Spratt, Robert H. Eklund, Eldon J. Zorinsky |
1991-12-24 |
| 5019525 |
Method for forming a horizontal self-aligned transistor |
David B. Spratt, Eldon J. Zorinsky |
1991-05-28 |
| 5001541 |
Advanced electromigration resistant interconnect structure and process |
Hoang Hoang |
1991-03-19 |
| 4985744 |
Method for forming a recessed contact bipolar transistor and field effect transistor |
David B. Spratt, Robert H. Eklund, Eldon J. Zorinsky |
1991-01-15 |
| 4982263 |
Anodizable strain layer for SOI semiconductor structures |
David B. Spratt, Eldon J. Zorinsky, Kenneth E. Bean, Richard L. Yeakley |
1991-01-01 |
| 4897703 |
Recessed contact bipolar transistor and method |
David B. Spratt, Robert H. Eklund, Eldon J. Zorinsky |
1990-01-30 |
| 4849370 |
Anodizable strain layer for SOI semiconductor structures |
David B. Spratt, Eldon J. Zorinsky, Kenneth E. Bean, Richard L. Yeakley |
1989-07-18 |