Issued Patents All Time
Showing 76–91 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5475698 | Light emission from rare-earth element-doped CaF.sub.2 thin films | — | 1995-12-12 |
| 5472913 | Method of fabricating porous dielectric material with a passivation layer for electronics applications | Robert H. Havemann, Bruce E. Gnade | 1995-12-05 |
| 5470802 | Method of making a semiconductor device using a low dielectric constant material | Bruce E. Gnade, Douglas M. Smith | 1995-11-28 |
| 5468561 | Etching and patterning an amorphous copolymer made from tetrafluoroethylene and 2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxole (TFE AF) | — | 1995-11-21 |
| 5453399 | Method of making semiconductor-on-insulator structure | — | 1995-09-26 |
| 5407860 | Method of forming air gap dielectric spaces between semiconductor leads | Richard Stoltz, Howard L. Tigelaar | 1995-04-18 |
| 5403437 | "Fluorosurfactant in photoresist for amorphous ""Teflon"" patterning" | Howard R. Beratan, Scott R. Summerfelt | 1995-04-04 |
| 5384795 | Light emission from rare-earth element-doped CaF.sub.2 thin films by electroluminescence | — | 1995-01-24 |
| 5369657 | Silicon-based microlaser by doped thin films | Walter M. Duncan | 1994-11-29 |
| 5364468 | Method for the growth of epitaxial metal-insulator-metal-semiconductor structures | — | 1994-11-15 |
| 5306385 | Method for generating photoluminescence emission lines from transition element doped CAF2 thin films over a Si-based substrate | Tsen-Hwang Lin, Shou-Kong Fan, Walter M. Duncan | 1994-04-26 |
| 5301204 | Porous silicon as a light source for rare earth-doped CaF.sub.2 laser | Walter M. Duncan | 1994-04-05 |
| 5262361 | Via filling by single crystal aluminum | Bruce E. Gnade | 1993-11-16 |
| 5229332 | Method for the growth of epitaxial metal-insulator-metal-semiconductor structures | — | 1993-07-20 |
| 5229333 | Method for improving the interface characteristics of CaF.sub.2 on silicon | Tae Seung Kim, Bruce E. Gnade, Yasushiro Nishioka, Hung-Yu Liu | 1993-07-20 |
| 5087485 | Isopropanol catalyst for copper chemical vapor deposition | — | 1992-02-11 |