Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265323 | Pellicle for an EUV lithography mask and a method of manufacturing thereof | Chao-Ching Cheng, Han Wang | 2025-04-01 |
| 12174526 | Pellicle for an EUV lithography mask and a method of manufacturing thereof | Chao-Ching Cheng, Han Wang, Ming-Yang Li, Gregory Michael Pitner | 2024-12-24 |
| 12166113 | Semiconductor device and method of fabricating the same | Chun-Chieh Lu, Chao-Ching Cheng, Lain-Jong Li | 2024-12-10 |
| 12151213 | Method of manufacturing semiconductor devices including the steps of removing one or more of the nanotubes from the stack of nanotubes, and/or removing spacers that surrounds each of the plurality of nanotubes, and forming gate dielectric and/or gate electrode to the nanotubes | Gregory Michael Pitner, Tse-An Chen, Lain-Jong Li, Yu-Chao Lin | 2024-11-26 |
| 11860534 | Pellicle for an EUV lithography mask and a method of manufacturing thereof | Chao-Ching Cheng, Han Wang | 2024-01-02 |
| 11854895 | Transistors with channels formed of low-dimensional materials and method forming same | Chao-Ching Cheng, Chun-Chieh Lu, Hung-Li Chiang, Tzu-Chiang Chen, Lain-Jong Li | 2023-12-26 |
| 11824106 | Semiconductor device and method of fabricating the same | Chun-Chieh Lu, Chao-Ching Cheng, Lain-Jong Li | 2023-11-21 |
| 11749528 | Method of manufacturing semiconductor devices including the steps of removing a plurality of spacers that surrounds each of the plurality of nanotubes into a layer of nanotubes, and forming gate dielectric and/or gate electrode | Gregory Michael Pitner, Tse-An Chen, Lain-Jong Li, Yu-Chao Lin | 2023-09-05 |
| 11417729 | Transistors with channels formed of low-dimensional materials and method forming same | Chao-Ching Cheng, Chun-Chieh Lu, Hung-Li Chiang, Tzu-Chiang Chen, Lain-Jong Li | 2022-08-16 |
| 11342181 | Semiconductor devices and methods of manufacture | Gregory Michael Pitner, Tse-An Chen, Lain-Jong Li, Yu-Chao Lin | 2022-05-24 |
| 11239354 | Semiconductor device and method of fabricating the same | Chun-Chieh Lu, Chao-Ching Cheng, Lain-Jong Li | 2022-02-01 |