Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6818533 | Epitaxial plasma enhanced chemical vapor deposition (PECVD) method providing epitaxial layer with attenuated defects | Sheng-Hsiung Chen, Shun-Long Chen, Ming-Shing Tsai, Lan-Chieh Shih | 2004-11-16 |
| 6730580 | Silicon substrate wafer fabrication method employing halogen gettering material and/or plasma annealing | Sheng-Hsiung Chen, Shun-Long Chen, Naite Chen | 2004-05-04 |
| 6560862 | Modified pad for copper/low-k | Sheng-Hsiung Chen, Shun-Long Chen | 2003-05-13 |
| 6518166 | Liquid phase deposition of a silicon oxide layer for use as a liner on the surface of a dual damascene opening in a low dielectric constant layer | Sheng-Hsiung Chen, Shun-Long Chen, Frank Hsu, Tsu Shih | 2003-02-11 |