Issued Patents All Time
Showing 126–137 of 137 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9536754 | Method of forming contact structure of gate structure | Audrey Hsiao-Chiu Hsu, Mei-Yun Wang, Hsien-Cheng Wang, Shih-Wen Liu, Hsin-Ying Lin | 2017-01-03 |
| 9496367 | Mechanism for forming metal gate structure | Tien-Chun Wang, Yi-Chun Lo, Chia-Der Chang, Guo-Chiang Chi, Chia Ping Lo +2 more | 2016-11-15 |
| 9437495 | Mask-less dual silicide process | Chen-Ming Lee, Hsien-Cheng Wang, Mei-Yun Wang | 2016-09-06 |
| 9425048 | Mechanisms for semiconductor device structure | Hsin-Ying Lin, Mei-Yun Wang, Hsien-Cheng Wang, Shih-Wen Liu, Audrey Hsiao-Chiu Hsu | 2016-08-23 |
| 9331173 | Semiconductor device having a carbon containing insulation layer formed under the source/drain | Shih-Wen Liu, Mei-Yun Wang, Hsien-Cheng Wang, Hsiao-Chiu Hsu, Hsin-Ying Lin | 2016-05-03 |
| 9312259 | Integrated circuit structure with thinned contact | Hsin-Ying Lin, Mei-Yun Wang, Hsien-Cheng Wang, Shih-Wen Liu, Audrey Hsiao-Chiu Hsu | 2016-04-12 |
| 9299657 | Semiconductor device and method for manufacturing semiconductor device | Audrey Hsiao-Chiu Hsu, Mei-Yun Wang, Hsien-Cheng Wang, Shih-Wen Liu, Hsin-Ying Lin | 2016-03-29 |
| 9231098 | Mechanism for forming metal gate structure | Tien-Chun Wang, Yi-Chun Lo, Chia-Der Chang, Guo-Chiang Chi, Chia Ping Lo +2 more | 2016-01-05 |
| 9123563 | Method of forming contact structure of gate structure | Audrey Hsiao-Chiu Hsu, Mei-Yun Wang, Hsien-Cheng Wang, Shih-Wen Liu, Hsin-Ying Lin | 2015-09-01 |
| 9093299 | Semiconductor arrangement and formation thereof | Shih-Wen Liu, Mei-Yun Wang, Hsien-Cheng Wang, Hsiao-Chiu Hsu, Hsin-Ying Lin | 2015-07-28 |
| 8372719 | Hard mask removal for semiconductor devices | Sheng-Hsiung Wang, Yuan-Ching Peng, Chi-Cheng Hung | 2013-02-12 |
| 7001836 | Two step trench definition procedure for formation of a dual damascene opening in a stack of insulator layers | Shu-Huei Suen | 2006-02-21 |