Issued Patents All Time
Showing 26–35 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7793253 | Mask-patterns including intentional breaks | Daniel Abrams, Yong Liu, Paul Rissman | 2010-09-07 |
| 7757201 | Method for time-evolving rectilinear contours representing photo masks | Daniel Abrams, Stanley Osher | 2010-07-13 |
| 7707541 | Systems, masks, and methods for photolithography | Daniel Abrams, Stanley Osher | 2010-04-27 |
| 7703068 | Technique for determining a mask pattern corresponding to a photo-mask | Daniel Abrams, Stanley Osher | 2010-04-20 |
| 7703049 | System, masks, and methods for photomasks optimized with approximate and accurate merit functions | Daniel Abrams | 2010-04-20 |
| 7571423 | Optimized photomasks for photolithography | Daniel Abrams, Stanley Osher | 2009-08-04 |
| 7480889 | Optimized photomasks for photolithography | Daniel Abrams | 2009-01-20 |
| 7441227 | Method for time-evolving rectilinear contours representing photo masks | Daniel Abrams, Stanley Osher | 2008-10-21 |
| 7178127 | Method for time-evolving rectilinear contours representing photo masks | Daniel Abrams, Stanley Osher | 2007-02-13 |
| 7124394 | Method for time-evolving rectilinear contours representing photo masks | Daniel Abrams, Stanley Osher | 2006-10-17 |