CC

Chia-Cheng Chao

TSMC: 14 patents #2,167 of 12,232Top 20%
NP Nan Ya Plastics: 1 patents #84 of 139Top 65%
Overall (All Time): #304,505 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
12347682 Using cumulative heat amount data to qualify hot plate used for post-exposure baking Chung-Cheng Wang, Chun-Kuang Chen 2025-07-01
12349381 Dielectric isolation structure for multi-gate transistors Jen-Hong Chang, Yuan-Ching Peng, Chung-Ting Ko, Kuo-Yi Chao, You-Ting Lin +4 more 2025-07-01
12342565 Semiconductor devices and methods of manufacturing thereof Hsin-Chieh Huang, Yu-Wen Wang 2025-06-24
12266529 Patterning semiconductor devices and structures resulting therefrom Chun-Yu Kao, Sung-En Lin 2025-04-01
12224209 Semiconductor device and manufacturing method thereof Hsin-Chieh Huang, Yu-Wen Wang 2025-02-11
12205822 Nanostructure and manufacturing method thereof Hsin-Chieh Huang, Yu-Wen Wang 2025-01-21
12166076 Semiconductor device and methods of forming the same Jen-Hong Chang, Yi-Hsiu Liu, You-Ting Lin, Chih-Chung Chang, Kuo-Yi Chao +4 more 2024-12-10
12062542 Using cumulative heat amount data to qualify hot plate used for postexposure baking Chung-Cheng Wang, Chun-Kuang Chen 2024-08-13
11888049 Dielectric isolation structure for multi-gate transistors Jen-Hong Chang, Yuan-Ching Peng, Chung-Ting Ko, Kuo-Yi Chao, You-Ting Lin +4 more 2024-01-30
11848209 Patterning semiconductor devices and structures resulting therefrom Chun-Yu Kao, Sung-En Lin 2023-12-19
11532733 Dielectric isolation structure for multi-gate transistors Jen-Hong Chang, Yi-Hsiu Liu, You-Ting Lin, Chih-Chung Chang, Kuo-Yi Chao +4 more 2022-12-20
11222783 Using cumulative heat amount data to qualify hot plate used for postexposure baking Chung-Cheng Wang, Chun-Kuang Chen 2022-01-11
10345718 Pattern forming method and apparatus for lithography Chung-Cheng Wang, Chun-Kuang Chen 2019-07-09
10203606 Apparatus and method for dispensing developer onto semiconductor substrate Chung-Cheng Wang, Chun-Kuang Chen 2019-02-12
9512257 Halogen-free, nonflammable and high glass transition temperature phenolic resin-based curing agent and process for producing the same Dein-Run Fung, Te-Chao Liao, Hao-Sheng Chen 2016-12-06