Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272733 | Transistor device for source/drain backside contact and method of forming cavity | Yi-Hsiu Chen | 2025-04-08 |
| 11942527 | Forming a cavity with a wet etch for backside contact formation | Yi-Hsiu Chen | 2024-03-26 |
| 11869769 | Method and system of control of epitaxial growth | Winnie Victoria Wei-Ning Chen | 2024-01-09 |
| 11728169 | Semiconductor device | Yusuke Oniki, Yasutoshi Okuno, Ta-Chun Ma | 2023-08-15 |
| 11600716 | Method for forming semiconductor structure with contact over source/drain structure | Yusuke Oniki | 2023-03-07 |
| 11437480 | Forming a cavity with a wet etch for backside contact formation | Yi-Hsiu Chen | 2022-09-06 |
| RE48942 | FinFET device with epitaxial structure | Po-Ruwe Tzng, Pei-Shan Chien, Wei-Hsiung Tseng | 2022-02-22 |
| 11257671 | Method and system of control of epitaxial growth | Winnie Victoria Wei-Ning Chen | 2022-02-22 |
| 11145544 | Contact etchback in room temperature ionic liquid | — | 2021-10-12 |
| 11101149 | Semiconductor fabrication with electrochemical apparatus | Yusuke Oniki | 2021-08-24 |
| 10854736 | Method for forming semiconductor structure with contact over source/drain structure | Yusuke Oniki | 2020-12-01 |
| 10763114 | Method of fabricating gate oxide of semiconductor device | Yusuke Oniki, Yasutoshi Okuno, Ta-Chun Ma | 2020-09-01 |
| 10720344 | Semiconductor fabrication with electrochemical apparatus | Yusuke Oniki | 2020-07-21 |
| 10468275 | Semiconductor fabrication with electrochemical apparatus | Yusuke Oniki | 2019-11-05 |
| 10163623 | Etch method with surface modification treatment for forming semiconductor structure | Yi-Hsiu Chen | 2018-12-25 |
| 10134871 | Doping of high-K dielectric oxide by wet chemical treatment | Yusuke Oniki | 2018-11-20 |
| 10056472 | Method for forming semiconductor structure with contact over source/drain structure | Yusuke Oniki | 2018-08-21 |
| 9911806 | Solvent-based oxidation on germanium and III-V compound semiconductor materials | Yusuke Oniki | 2018-03-06 |
| 9882017 | Thin oxide formation by wet chemical oxidation of semiconductor surface when the one component of the oxide is water soluble | Yusuke Oniki | 2018-01-30 |
| 9761440 | Surface passivation on indium-based materials | Yusuke Oniki | 2017-09-12 |
| 9412605 | Method of removing oxide on semiconductor surface by layer of sulfur | Yusuke Oniki | 2016-08-09 |
| 9385197 | Semiconductor structure with contact over source/drain structure and method for forming the same | Yusuke Oniki | 2016-07-05 |
| 9373549 | Semiconductor device and method of forming the same | Clement Hsingjen Wann, Chih-Hao Chang, Shou-Zen Chang, Chih-Hsin Ko, Yasutoshi Okuno | 2016-06-21 |
| 9324820 | Method for forming semiconductor structure with metallic layer over source/drain structure | Yusuke Oniki | 2016-04-26 |
| 9263277 | Metal gate structure of a semiconductor device | Pei-Shan Chien | 2016-02-16 |